Trung Ha, Entry #3
Hello guys,
It might just be me but this week has been rather uneventful.
There's a new high school student in the lab. However, me being me, I forgot her name despite having asked her twice. I really am a horrible person...
In the lab, I learned the two last procedures of the synthesis of MoS2-FET
FET is the acronym for Field Effect Transistor. Field Effect Transistor consist of gate (insulating layer), source and drain, a conducting layer and semiconducting layer to control the current in response to voltage. In our lab, sillicon is used for the conducting layer, sillicon dioxide is the insulating layer and gold is the source and drain (where voltage is applied). For my particular project Molybdenum disulfide is chosen to be the semiconducting material that lie between the source and the drain. Therefore, there's an integral process in synthesizing chips and devices which is MoS2 transfer.
First, we cut from the synthesized wafer of MoS2 an area with the highest density of MoS2 to enhance the chance of connecting the source and drain (The device only works if MoS2 flake connect source and drain). Then we use scotch tape to tape them onto a glass surface to spincoat it with PMMA. You can see the difference in color of spincoated area and area covered by scotch tape. After spincoatting, we put them in KOH 1M bath for several hours. The MoS2 flakes along with PMMA will float, creating a very thin layer on the surface of the bath while the base sillicon wafer will sink to the bottom. Then we retrieve the thin layer and put in deionized water bath for 30 mins then transfer it onto the device. The process is rather delicate so I have trouble performing it sometimes because of my hands shaking.
During this week, I also pay the Singh Center a visit for the lithography process.
We use light photolithography (using light exposure) to etch the device. During the lithography project I also get to see Ram designing the new chip for our lab. It was really cool!!
Aside from the lab, not much has been going on this week for me. I played some chess in the hallway with my apartment managers and saw Elaine over the weekend. Oh I almost forgot the juicy free EXP lunch that I had with my wonderful peers. Unfortunately I couldn't stay long because I was growing MoS2, sorry Dr. Peretz:(
See you all next week
It might just be me but this week has been rather uneventful.
There's a new high school student in the lab. However, me being me, I forgot her name despite having asked her twice. I really am a horrible person...
In the lab, I learned the two last procedures of the synthesis of MoS2-FET
FET is the acronym for Field Effect Transistor. Field Effect Transistor consist of gate (insulating layer), source and drain, a conducting layer and semiconducting layer to control the current in response to voltage. In our lab, sillicon is used for the conducting layer, sillicon dioxide is the insulating layer and gold is the source and drain (where voltage is applied). For my particular project Molybdenum disulfide is chosen to be the semiconducting material that lie between the source and the drain. Therefore, there's an integral process in synthesizing chips and devices which is MoS2 transfer.
During this week, I also pay the Singh Center a visit for the lithography process.
Aside from the lab, not much has been going on this week for me. I played some chess in the hallway with my apartment managers and saw Elaine over the weekend. Oh I almost forgot the juicy free EXP lunch that I had with my wonderful peers. Unfortunately I couldn't stay long because I was growing MoS2, sorry Dr. Peretz:(
See you all next week
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